Aselta nanographics

Enabling nanolithography ASELTA operates in the IC manufacturing worl and provides advanced software solutions for wafer and mask patterning base. Mission ASELTA operates in the IC manufacturing worl and provides advanced software solutions for wafer and mask patterning based on e-Beam technolo. ASELTA Nanographics Designed by LITHOGRAPHERS for LITHOGRAPHERS Solutions For the wafer patterning market, ASELTA helps its customers to reach . Please with your user name and password.

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M € uros to speed deployment of electron lithography optimization software. Learn about working at ASELTA Nanographics. See who you know at ASELTA Nanographics , leverage your professional network, and get hired.

Job Opportunities ASELTA develops and markets lithography software solution for leading edge silicon technology at 28-nm logic node and below. What information do we collect? We collect information from you when you register on our site or subscribe to our newsletter.

MAGIC : MAsk-less lithoGraphy for integrated circuits (IC) manufacturing. The MAGIC project has supported the development of e-beam based . Mike Rieger, CTO, Synopsys, USA Dr. Mario Paniccia, Intel Fellow, Intel, USA Dr. John Sturtevant, Director, Mentor Graphics, USA Dr.

Manabu Tsujimura, CTO, Ebara Corporation, Japan Prof. The company has exclusive licenses to several Leti patents. General purpose CPUs used in high performance computing. The resulting curve for the same family of . Asia for market prospecting, customer support and pilot line set up. Provide expertise and state of the art technologies in . Preliminary investigation of shot noise, dose, and focus latitude for e-beam direct write.

Proximity Effects in electron beam lithography impact feature dimensions, pattern fidelity and uniformity. Specialization : “Data preparation for electron beam lithography” Achievements: - Experimental data analysis (data mining, sensitivity method) - Design of high performance data fit algorithm for electron beam lithography data-preparation - Design of . Up to now, calibration is achieved by measuring patterns dimensions after resist development. Products and solutions developped by CWS are very easy to use, fast and accurate. Université Pierre et Marie Curie (Paris VI ) . They provide high added-value to: - Prototype SLN issues before RTL .